Embedded attenuating phase-shift mask:printability of defects

Embedded attenuating phase-shift mask:printability of defects

Author(s):

Singh,R.R. ( Intel Corp. )

Publication title:

15th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2621

Pub. Year:

1995

Page(from):

273

Page(to):

290

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819419859 [0819419850]

Language:

English

Call no.:

P63600/2621

Type:

Conference Proceedings

Details

TDL ID:	ZA00017469
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1995 : 15th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	1995.09.20-1995.09.22

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