Repeatable mask metrology for next-generation lithography tools
- Author(s):
- Hentschel,S.L. ( Nikon Precision Inc. )
- Kamberian,H.
- Kovatch,J.
- Publication title:
- 15th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2621
- Pub. Year:
- 1995
- Page(from):
- 189
- Page(to):
- 197
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819419859 [0819419850]
- Language:
- English
- Call no.:
- P63600/2621
- Type:
- Conference Proceedings
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