Novel techniques on photomask blanks enhancement for the laser reticle writer

Author(s):

• Kobayashi,H. ( Hoya Corp. )
• Asakawa,K.
• Yokoya,Y.

Publication title:

15th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2621

Pub. Year:

1995

Page(from):

73

Page(to):

89

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819419859 [0819419850]

Language:

English

Call no.:

P63600/2621

Type:

Conference Proceedings