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Evaluation of commercial and experimental resist materials for use in MEBES mask making

Author(s):
Sauer,C.A. ( Etec Systems,Inc. )
Dean,R.L.
Morita,E.
Tan,Z.C.
Smith,B.W.
Ewbank,D.E.
Duttagupta,S.P.
Rudack,A.
3 more
Publication title:
15th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2621
Pub. Year:
1995
Page(from):
52
Page(to):
61
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819419859 [0819419850]
Language:
English
Call no.:
P63600/2621
Type:
Conference Proceedings

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