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Monolithic integration in III-V semiconductors via a universal damage enhanced quantum well intermixing technique

Author(s):
Marsh,J.H. ( Univ.of Glasgow (UK) )
Kowalski,O.P. ( Univ.of Glasgow (UK) )
McDougall,S.D. ( Univ.of Glasgow (UK) )
Hamilton,C.J. ( Univ.of Glasgow (UK) )
Camacho,F. ( Univ.of Glasgow (UK) )
Qiu,B. ( Univ.of Glasgow (UK) )
Ke,M. ( Univ.of Glasgow (UK) )
De La Rue,R.M. ( Univ.of Glasgow (UK) )
Bryce,A.C. ( Univ.of Glasgow (UK) )
4 more
Publication title:
Materials Modification by Ion Irradiation
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3413
Pub. Year:
1998
Page(from):
112
Page(to):
120
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428677 [0819428671]
Language:
English
Call no.:
P63600/3413
Type:
Conference Proceedings

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