Blank Cover Image

Silicidation and metallization issues using Rapid Thermal Processing

Author(s):
Maex K.  
Publication title:
Advances in rapid thermal and integrated processing
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
318
Pub. Year:
1996
Page(from):
333
Page(to):
374
Pages:
42
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792340119 [0792340116]
Language:
English
Call no.:
N11482/318
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Control and Impact of Processing Ambient During Rapid Thermal Silicidation

Maex, K., Kondoh, E., Lauwers, A., Steegen, A., Potter, M. De, Besser, P., Proost, J.

MRS - Materials Research Society
7 Conference Proceedings Critical Issues in Rapid Thermal Processing of Compound Semiconductors

Singh, R.K., Nagabhusnam, R.

Electrochemical Society
2 Conference Proceedings TEMPERATURE CONTROL AND UNIFORMITY DURING RAPID THERMAL SILICIDATION

Eichhammer, Wolfgang, Vandernabeele, Peter, Maex, Karen

Materials Research Society
8 Conference Proceedings IN-SITU EMMISSIVITY AND TEMPERATURE MEASUREMENT DURING RAPID THERMAL PROCESSING (RTP)

Vandenabeele, P., Schreutelkamp, R. J., Maex, K., Vermeiren, C., Coppye, W.

Materials Research Society
3 Conference Proceedings Silicidation by Rapid Thermal Processing

Van den Hove L., De Keersmaecker F. R.

Plenum Press
9 Conference Proceedings Temperature Measurement Issues in Rapid Thermal Processing

DeWitt, D. P., Sorrell, F. Y., Elliott, J. K.

MRS - Materials Research Society
4 Conference Proceedings In Situ Oxygen Monitoring of Rapid Thermal Process Chamber: Diagnosis of Gas Flow Dynamics and Wafer Processing

Kondoh, E., Maex, K.

MRS - Materials Research Society
10 Conference Proceedings 29 Influence of Activation Annealing and Silicidation Process on as Redistribution and Pile-up at the NixSiy/SiO2 Interface

Pawlak, M., Kittl, J. A., Janssens, T., Lauwers, A., Vandervorst, W., Anil, K. G., Schram, T., Veloso, A., van Dal, M.J. …

Electrochemical Society
5 Conference Proceedings *IMPACT OF PATTERED LAYERS ON TERMPERATURE NON-UNIFORMITY DURING RAPID THERMAL PROCESSING FOR VLSI-APPLICATIONS

Vandenabeele, P., Maex, K., De Keersmaecker, R.

Materials Research Society
11 Conference Proceedings Influence of the As and BF2 Junction Implantation on Stress Induced Defects During Ti- and Co/Ti-Silicidation

Steegen, A., Bender, H., Wolf, I. De, Maex, K.

MRS - Materials Research Society
6 Conference Proceedings *TEMPERATURE CONTROL AND TEMPERATURE UNIFORMITY DURING RAPID THERMAL PROCESSING

Vadenabeele, Peter, Maex, Karen

Materials Research Society
12 Conference Proceedings Rapid Thermal Silicidation in Silicon-Germanium and SOI Devices

Chen, Li., Wu, W.W, Liu, C.H., Chiang, T.F., Cheng, S.L., Lee, S.W.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12