Lens FPD and LH effect on CD control of lithography process

Lens FPD and LH effect on CD control of lithography process

Author(s):

Huang,D.F. ( Taiwan Semiconductor Manufacturing Co. )
Hung,C.-C.

Publication title:

Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3892

Pub. Year:

1999

Page(from):

282

Page(to):

288

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434937 [0819434930]

Language:

English

Call no.:

P63600/3892

Type:

Conference Proceedings

Details

TDL ID:	ZA00017166
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for MEMS and microelectronics
Conf. info. (Number):	1999
Conf. info. (Venue):	Royal Pines Resort, Queensland, Australia
Conf. info. (Date):	1999.10.27-1999.10.29

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