Characterization of sub-0.18-ヲフm critical dimension pattern collapse for yield improvement
- Author(s):
Zhong,T.X. ( Silicon Valley Group,Inc ) Gurer,E. Lee,E. Bai,H. Gendron,B. Krishna,M.S. Reynolds,R.M. - Publication title:
- Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3882
- Pub. Year:
- 1999
- Page(from):
- 158
- Page(to):
- 168
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434791 [0819434795]
- Language:
- English
- Call no.:
- P63600/3882
- Type:
- Conference Proceedings
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