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In Situ Oxygen Monitoring of Rapid Thermal Process Chamber: Diagnosis of Gas Flow Dynamics and Wafer Processing

Author(s):
Publication title:
Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
470
Pub. Year:
1997
Page(from):
245
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993747 [1558993746]
Language:
English
Call no.:
M23500/470
Type:
Conference Proceedings

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