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Near-Edge X-ray Absorption Fine Structure Examination of Chemical Bonding in Sputter Deposited Boron and Boron-Nitride Films

Author(s):
Jankowski, A. F.
Jimenez, I.
Hayes, J. P.
Shuh, D. K.
Tong, W. M.
Sutherland, D. G. J.
Carlisle, J. A.
Terminello, L. J.
Himpsel, F. J.
4 more
Publication title:
Applications of synchrotron radiation techniques to materials science III : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
437
Pub. Year:
1996
Page(from):
207
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993402 [1558993401]
Language:
English
Call no.:
M23500/437
Type:
Conference Proceedings

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