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MOCVD of Copper from New and Liquid Precursors (hfac)CuL, Where L = 1-Pentene, ATMS, and VTMOS

Author(s):
Shin, H. K.
Shin, H. J.
Lim, S. J.
Yoo, D. J.
Oh, N. Y.
Yoo, H. J.
Baek, J. T.
Jun, C. H.
Kim, Y. T.
4 more
Publication title:
Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
427
Pub. Year:
1996
Page(from):
219
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993303 [1558993304]
Language:
English
Call no.:
M23500/427
Type:
Conference Proceedings

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