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Detailed Analysis and Computationally Efficient Modeling of Ultra-Shallow Dopant Profiles Obtained by Low Energy B, BF2, and As Ion Implantation

Author(s):
Parab, K. B.
Yang, S. -H.
Morris, S. J.
Tian, S.
Morris, M.
Obradovich, B.
Tasch, A. F.
Kamenitsa, D.
Simonton, R.
Magee, C.
5 more
Publication title:
Ion-solid interactions for materials modification and processing : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
396
Pub. Year:
1996
Page(from):
769
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992993 [1558992995]
Language:
English
Call no.:
M23500/396
Type:
Conference Proceedings

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