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Comparative Study of Experimental Techniques for Boron Profiling at Poly-Si/SiO2 Interface

Author(s):
Furtsch, M.
Bevk, J.
Bude, J.
Downey, S. W.
Krisch, K. S.
Moriya, N.
Silverman, P. J.
Luftman, H. S.
3 more
Publication title:
Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
378
Pub. Year:
1995
Page(from):
857
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992818 [1558992812]
Language:
English
Call no.:
M23500/378
Type:
Conference Proceedings

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