TEMPERATURE DEPENDENCE OF THE INTRINSIC STRESS AND BIAXIAL MODULUS OF PLASMA DEPOSITED SILICON NITRIDE AND SILICON OXYNITRIDE FILMS

TEMPERATURE DEPENDENCE OF THE INTRINSIC STRESS AND BIAXIAL MODULUS OF PLASMA DEPOSITED SILICON NITRIDE AND SILICON OXYNITRIDE FILMS

Author(s):

Publication title:

Thin films, stresses and mechanical properties V : symposium held November 28-December 2, 1994, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

356

Pub. Year:

1995

Page(from):

221

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992573 [155899257X]

Language:

English

Call no.:

M23500/356

Type:

Conference Proceedings

Details

TDL ID:	ZA00017048
Series ID:	PA00000011
Conf. info. (Name):	Symposium on thin films
Conf. info. (Number):	5th
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1994.11.28-1994.12.02

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