E-beam lithography:a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles
- Author(s):
- Kley,E.-B. ( Friedrich-Schiller-Univ.Jena )
- Schnabel,B.
- Publication title:
- Microlithography and Metrology in Micromachining
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2640
- Pub. Year:
- 1995
- Page(from):
- 71
- Page(to):
- 80
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420060 [0819420069]
- Language:
- English
- Call no.:
- P63600/2640
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
E-beam lithography:an efficient tool for the fabrication of diffractive and micro-optical elements
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Alternative method of gray-tone lithography with potential for the fabrication of combined continuous 3D surface profiles and subwavelength structures
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
"Fabrication and properties of refractive micro-optical profiles for lenses, lens arrays, and beam-shaping elements"
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Evaluation and suppression of systematic errors in optical subwavelength gratings
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |