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Analysis of off-axis shaped beam systems for high-throughput electron-beam lithography

Author(s):
  • Zhu,X. ( Munro's Electron Beam Software Ltd. (UK) )
  • Liu,H. ( Munro's Electron Beam Software Ltd. (UK) )
  • Munro,E. ( Munro's Electron Beam Software Ltd. (UK) )
  • Rouse,J. ( Munro's Electron Beam Software Ltd. (UK) )
Publication title:
Charged particle optics III : 27-28 July 1997, San Diego, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3155
Pub. Year:
1997
Page(from):
47
Page(to):
61
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425775 [081942577X]
Language:
English
Call no.:
P63600/3155
Type:
Conference Proceedings

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