Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)

Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)

Author(s):

Waskiewicz,W.K. ( Lucent Technologies/Bell Labs. )
Liddle,J.A. ( Lucent Technologies/Bell Labs. )

Publication title:

Charged particle optics III : 27-28 July 1997, San Diego, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3155

Pub. Year:

1997

Page(from):

2

Page(to):

13

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425775 [081942577X]

Language:

English

Call no.:

P63600/3155

Type:

Conference Proceedings

Details

TDL ID:	ZA00016937
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Charged Particle Optics
Conf. info. (Number):	1997 : 3rd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1997.07.27-1997.07.28

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