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PL study of QDs manufactured by visible light lithography and wet etching

Author(s):
Liu,X. ( Shanghai Institute of Technical Physics (China) )
Wan,M. ( Shanghai Institute of Technical Physics (China) )
Zhang,B. ( Shanghai Institute of Technical Physics (China) )
Chen,X. ( Shanghai Institute of Technical Physics (China) )
Lu,W. ( Shanghai Institute of Technical Physics (China) )
Shen,S.C. ( Shanghai Institute of Technical Physics (China) )
1 more
Publication title:
Third International Conference on Thin Film Physics and Applications : 15-17 April 1997, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3175
Pub. Year:
1998
Page(from):
412
Page(to):
414
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426734 [0819426733]
Language:
English
Call no.:
P63600/3175
Type:
Conference Proceedings

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