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Lithography using a compact plasma focus electron source

Author(s):
  • Lee,P. ( Nanyang Technological Univ.(Singapore) )
  • Feng,X. ( Nanyang Technological Univ.(Singapore) )
  • Zhang,G.X. ( Nanyang Technological Univ.(Singapore) )
  • Liu,M.H. ( Nanyang Technological Univ.(Singapore) )
  • Lee,S. ( Nanyang Technological Univ.(Singapore) )
Publication title:
Microlithographic Techniques in IC Fabrication
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3183
Pub. Year:
1997
Page(from):
169
Page(to):
177
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426109 [0819426105]
Language:
English
Call no.:
P63600/3183
Type:
Conference Proceedings

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