Rapid in-fab monitoring of ion implant doses using total reflection x-ray fluorescence

Rapid in-fab monitoring of ion implant doses using total reflection x-ray fluorescence

Author(s):

Weiss,C.A. ( AMD Saxony Manufacturing GmbH (FRG) )
Hossain,T.Z. ( Advanced Micro Devices,Inc. )
Zschech,E. ( AMD Saxony Manufacturing GmbH (FRG) )
MacDonald,B.J. ( Advanced Micro Devices,Inc. )

Publication title:

In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3215

Pub. Year:

1997

Page(from):

128

Page(to):

136

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426475 [0819426474]

Language:

English

Call no.:

P63600/3215

Type:

Conference Proceedings

Details

TDL ID:	ZA00016931
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing
Conf. info. (Number):	1997
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1997.10.01-1997.10.02

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