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Improvement of ultrathin gate oxide by a novel rapid thermal oxidation process with in-situ steam generation

Author(s):
Yu,M.C. ( Taiwan Semiconductor Manufacturing Co. )
Jang,S.M.
Diaz,C.H.
Yu,C.H.
Sun,S.C.
Liang,M.S.
1 more
Publication title:
Microelectronic Device Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3881
Pub. Year:
1999
Page(from):
234
Page(to):
241
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434784 [0819434787]
Language:
English
Call no.:
P63600/3881
Type:
Conference Proceedings

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