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Degradation of PMOS series resistance due to Si implantation for Ti-salicide process

Author(s):
Lim,E.H. ( Chartered Semiconductor Manufacturing Ltd. )
Siah,S.-Y.
Lim,C.W.
Lee,Y.M.
Zheng,J.Z.
Sundaresan,R.
Pey,K.L.
2 more
Publication title:
Microelectronic Device Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3881
Pub. Year:
1999
Page(from):
152
Page(to):
158
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434784 [0819434787]
Language:
English
Call no.:
P63600/3881
Type:
Conference Proceedings

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