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Optical superlattices as phase-shift masks for microlithography

Author(s):
Carcia,P.F. ( DuPont Central Research and Development )
French,R.H.
Reynolds,G.A.M.
Hughes,G.P.
Torardi,C.C.
Reilly,M.H.
Lemon,M.F.
Miao,C.R.
Jones,D.J.
Wilson,L.
Dieu,L.
6 more
Publication title:
Engineered nanostructural films and materials : 22-23 July 1999, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3790
Pub. Year:
1999
Page(from):
23
Page(to):
35
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432766 [0819432768]
Language:
English
Call no.:
P63600/3790
Type:
Conference Proceedings

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