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In situ spectroscopic ellipsometry study of the oxide etching and surface damaging processes on silicon under hydrogen plasma

Author(s):
Publication title:
Nondestructive methods for materials characterization : symposium held November 29-30, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
591
Pub. Year:
2000
Page(from):
295
Pub. info.:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994997 [1558994998]
Language:
English
Call no.:
M23500/591
Type:
Conference Proceedings

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