Blank Cover Image

In situ spectroscopic ellipsometry for the real time process control of plasma etching of silicon nitride

Author(s):
Publication title:
Nondestructive methods for materials characterization : symposium held November 29-30, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
591
Pub. Year:
2000
Page(from):
263
Pub. info.:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994997 [1558994998]
Language:
English
Call no.:
M23500/591
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings In Situ Spectroscopic Ellipsometry and Optical Emission Studies of CF4/O2 Plasma Etching of Silicon Nitride

Parent, T., Tie, J., Madhukar, A.

MRS - Materials Research Society
7 Conference Proceedings In-situ Spectroscopic Ellipsometry and Plasma Control for Large-Scale Magnetron Sputter Deposition Processes

M. Vergöhl, N. Malkomes, T. Matthée, G. Bräuer, U. Richter, F.-W. Nickolc, J. Bruch

Society of Vacuum Coaters
2 Conference Proceedings Real-Time Feedback Control of Thermal Cl2 Etching of GaAs Based on In Situ Spectroscopic Ellipsometry

Parent, T., Heitz, R., Chen, P., Madhukar, A.

MRS - Materials Research Society
8 Conference Proceedings REAL-TIME DIAGNOSIS OF ETCHING AND DESPOSITION PROCESSES BY SPECTROSCOPIC ELLIPSOMETRY

Aspnes, D. E., Chang, R. P. H.

North-Holland
3 Conference Proceedings Modelling and Validation of Sensor and Actuator Dynamics for, and Real-Time Feedback Control of, Thermal Chlorine Etching of Gallium Arsenide

Rosen, I. G., Parent, T., Mancera, R., Chen, P., Madhukar, A.

MRS - Materials Research Society
9 Conference Proceedings In Situ Observation of Silicon Epitaxy Breakdown With Real-Time Spectroscopic Ellipsometry

Teplin, Charles W., Levi, Dean H., Wang, Qi, Iwaniczko, Eugene, Jones, Kim M., Branz, Howard M.

Materials Research Society
4 Conference Proceedings In situ spectroscopic ellipsometry study of the oxide etching and surface damaging processes on silicon under hydrogen plasma

Vargas, I. M., Manso, J. Y., Guzman, J. R., Weiner, B. R., Morell, G.

MRS-Materials Research Society
10 Conference Proceedings IN SITU STUDIES OF ELECTRON CYCLOTRON RESONANCE PLASMA ETCHING OF SEMICONDUCTORS BY SPECTROSCOPIC ELLIPSOMETRY

Nafis, S., Ianno, N.J., Snyder, Paul G., Woollam, John A., Johs, Blaine

Materials Research Society
5 Conference Proceedings In Situ Control of Wet Etching Using Spectroscopic Ellipsometry

Cho, S-J., Snyder, P. G.

MRS - Materials Research Society
11 Conference Proceedings Initial plasma oxidation of silicon studied by real-time ellipsometry

Kitajima,M., Kamioka,I., Kurashina,T., Nakamura,K.G.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD

Nozawa, K., Katayama, K., Kanzawa, Y., Sugahara, G., Saitoh, T., Kubo, M.

MRS - Materials Research Society
12 Conference Proceedings Real-Time Spectroscopic Ellipsometry as an In Situ Probe of the Growth Dynamics of Amorphous and Epitaxial Crystal Silicon for Photovoltaic Applications

Levi, D.H., Teplin, C.W., Iwaniczko, E., Yan, Y., Wang, T.H., Branz, H.M.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12