Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD

Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD

Author(s):

Nozawa, K.

Publication title:

In situ process diagnostics and modelling : symposium held April 6-7, 1999, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

569

Pub. Year:

1999

Page(from):

83

Pub. info.:

Warrendale, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994768 [1558994769]

Language:

English

Call no.:

M23500/569

Type:

Conference Proceedings

Details

TDL ID:	ZA00016595
Series ID:	PA00000011
Conf. info. (Name):	Symposium on in situ process diagnostics and modelling
Conf. info. (Number):	1999
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1999.04.06-1999.04.07

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