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Lattice Sites and Damage Annealing of Implanted Tm and Er in Si

Author(s):
Wahl, U.
Correia, J. G.
Wachter, J. De
Langouche, G.
Marques, J. G.
Moons, R.
Vantomme, A.
the ISOLDE Collaboration
3 more
Publication title:
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
469
Pub. Year:
1997
Page(from):
407
Pub. info.:
Pittsburg, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993730 [1558993738]
Language:
English
Call no.:
M23500/469
Type:
Conference Proceedings

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