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The Effect of the Extra Ion on Residual Damage in MeV-Implanted Si

Author(s):
Libertino, S.
Benton, J. L.
Coffa, S.
Jacobson, D. C.
Eaglesham, D. J.
Poate, J. M.
Lavalle, M.
Fuochi, P. G.
3 more
Publication title:
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
469
Pub. Year:
1997
Page(from):
187
Pub. info.:
Pittsburg, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993730 [1558993738]
Language:
English
Call no.:
M23500/469
Type:
Conference Proceedings

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