Characterization of a-SiNx Thin Film Deposited by Inductively-Coupled Plasma-Enhanced Chemical Vapor Deposition

Characterization of a-SiNx Thin Film Deposited by Inductively-Coupled Plasma-Enhanced Chemical Vapor Deposition

Author(s):

Publication title:

Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

446

Pub. Year:

1997

Page(from):

139

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993501 [1558993509]

Language:

English

Call no.:

M23500/446

Type:

Conference Proceedings

Details

TDL ID:	ZA00016584
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous and crystalline insulating thin films
Conf. info. (Number):	1996
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1996.12.02-1996.12.04

Similar Items:

1 Conference Proceedings The Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography Jun, Byung-Hyuk, Han, Sang-Soo, Kim, Dong-Wan, Kang, Ho-Young, Koh, Young-Bum, Bae, Byeong-Soo, No, Kwangsoo MRS - Materials Research Society	7 Conference Proceedings DEPOSITION AND CHARACTERIZATION OF NEAR ‘INTRINSIC” μc-Si FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION -RPECVD Williams, M.J., Wang, C., Lucovsky, G. Materials Research Society
2 Conference Proceedings Nanocrystalline-Si Thin Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) Han, Sang-Myeon, Park, Joong-Hyun, Lee, Hye-Jin, Shin, Kwang-Sub, Han, Min-Koo Materials Research Society	8 Conference Proceedings *THE ELECTRICAL PROPERTIES OF SILICON OXIDE DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD) Kim, Sang S., Tsu, D. V., Lucovsky, G. Materials Research Society
3 Conference Proceedings The Characteristics of Silicon Dioxide Deposited by Inductively Coupled Plasma Chemical Vapor Deposition at 150℃ Kang, Su-hyuk, Lee, Min-Cheol, Moon, Kook-Chul, Han, Min-koo Materials Research Society	9 Conference Proceedings THE ELECTRICAL PROPERTIES OF SILICON OXIDE DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD) Kim, Sang S., Tsu, D. V., Lucovsky, G. Materials Research Society
4 Conference Proceedings Preparation and Characterization of SrTiO3 Thin Films Using ECR Plasma Assisted MOCVD Lee, Joon Sung, Song, Han Wook, Yoon, Dae Sung, Jun, Byung Hyuk, Yu, Byoung Gon, Jiang, Zhong Tao, Lee, Won Jong, No, … MRS - Materials Research Society	10 Conference Proceedings QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S. Materials Research Society
5 Conference Proceedings Epitaxial Growth and Optical Properties of Sol-Gel (Pb, La)TiO3 Thin Films for Waveguides Koo, Junmo, Lee, Changho, No, Kwangsoo, Bae, Byeong-Soo MRS - Materials Research Society	11 Conference Proceedings Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L. Electrochemical Society
6 Conference Proceedings Characterization of Silicon Thin Film Deposited by E-Beam Evaporator for Flexible Display Song, In-Hyuk, Han, Sang-Myeon, Park, Jung-Hyun, Han, Min-Koo Materials Research Society	12 Conference Proceedings BONDED HYDROGEN IN SILICON OXIDE THIN FILMS DEPOSITED BY REMOT PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Tsu, D. V., Lucovsky, G. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12