Structure Effect on Electrical Properties of ITO Films Prepared by RF Reactive Magnetron Sputtering

Structure Effect on Electrical Properties of ITO Films Prepared by RF Reactive Magnetron Sputtering

Author(s):

Publication title:

Thin films for photovoltaic and related device applications

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

426

Pub. Year:

1996

Page(from):

431

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993297 [1558993290]

Language:

English

Call no.:

M23500/426

Type:

Conference Proceedings

Details

TDL ID:	ZA00016582
Series ID:	PA00000011
Conf. info. (Name):	Symposium on thin films for photovoltaic and related device applications
Conf. info. (Number):	1996
Conf. info. (Venue):	San Francisco, California, USA
Conf. info. (Date):	1996.04.08-1996.04.11

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