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Defects and Microstructure in Optimized a-Si:Ge:H-New Results from Electron Spin Resonance Experiments

Author(s):
Malten, C.
Finger, F.
Folsch, J.
Kulessa, T.
Wagner, H.
Ray, S.
Middya, A. R.
Hazra, S.
3 more
Publication title:
Amorphous silicon technology, 1995 : Symposium held April 18-21, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
377
Pub. Year:
1995
Page(from):
559
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992801 [1558992804]
Language:
English
Call no.:
M23500/377
Type:
Conference Proceedings

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