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Effect of Plasma Damage on Interface State Density Between a-Si:H and Insulating Films

Author(s):
Publication title:
Amorphous silicon technology, 1995 : Symposium held April 18-21, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
377
Pub. Year:
1995
Page(from):
9
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992801 [1558992804]
Language:
English
Call no.:
M23500/377
Type:
Conference Proceedings

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