Performance analysis of ArF excimer laser lithography optics
- Author(s):
- Lee,K.H. ( Electronics and Telecommunications Research Institute )
- Kim,D.H.
- Kim,J.S.
- Chung,H.B.
- Yoo,H.J.
- Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 948
- Page(to):
- 958
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Baseline error-free non-TTL alignment system using oblique illumination for wafer steppers
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Design of illumination aperture for ArF exposure system with wide exposing latitude
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Haze acceleration system for photo mask application by using high repetition ArF excimer laser
Society of Photo-optical Instrumentation Engineers |