Performance of small-field 193-nm exposure system
- Author(s):
Kim,D.H. ( Electronics and Telecommunications Research Institute ) Lee,K.H. Kim,J.S. Choi,S.S. Oh,H.-K. Chung,H.B. Yoo,H.J. - Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 922
- Page(to):
- 932
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
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