Temperature dependence of UV-induced compaction in fused silica
- Author(s):
- Piao,F. ( Univ.of California/Berkeley )
- Schenker,R.E.
- Oldham,W.G.
- Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 907
- Page(to):
- 912
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Chemical etch effects on laser-induced surface damage growth in fused silica
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Martinus Nijhoff Publishers |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Compaction and rarefaction of fused silica with 193-nm excimer laser exposure
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
At-wavelength characterization of DUV-radiation-induced damage in fused silica
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |