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Effects of excimer laser radiation on attenuated phase-shift masking materials

Author(s):
Smith,B.W. ( Rochester Institute of Technology )
Zavyalova,L.
Butt,S.A.
Bourov,A.
Bergman,N.
Fonseca,C.A.
Alam,Z.
2 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. Year:
1997
Page(from):
236
Page(to):
244
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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