Understanding across-chip line-width variation:the first step toward optical proximity correction
- Author(s):
- Liebmann,L.W. ( IBM Microelectronics Div. )
- Molless,A.
- Ferguson,R.A.
- Wong,A.K.
- Mansfield,S.M.
- Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 124
- Page(to):
- 136
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
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