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Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks

Author(s):
Matsumoto,M. ( Dai Nippon Printing Co.,Ltd.(Japan) )
Abe,T. ( Dai Nippon Printing Co.,Ltd.(Japan) )
Yokoyama,T. ( Dai Nippon Printing Co.,Ltd.(Japan) )
Miyashita,H. ( Dai Nippon Printing Co.,Ltd.(Japan) )
Hayashi,N. ( Dai Nippon Printing Co.,Ltd.(Japan) )
Sano,H. ( Dai Nippon Printing Co.,Ltd.(Japan) )
1 more
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
308
Page(to):
321
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

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