Mask bias effects in e-beam cell-projection lithography

Mask bias effects in e-beam cell-projection lithography

Author(s):

Ema,T. ( NEC Corp.(Japan) )
Yamashita,H. ( NEC Corp.(Japan) )
Nakajima,K. ( NEC Corp.(Japan) )
Nozue,H, ( NEC Corp.(Japan) )

Publication title:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3096

Pub. Year:

1997

Page(from):

275

Page(to):

283

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

Language:

English

Call no.:

P63600/3096

Type:

Conference Proceedings

Details

TDL ID:	ZA00016472
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1997 : 4th
Conf. info. (Venue):	Kawasaki, Japan
Conf. info. (Date):	1997.04.17-1997.04.18

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