Proximity effect correction for reticle fabrication

Proximity effect correction for reticle fabrication

Author(s):

Kamikubo,T. ( Toshiba Corp.(Japan) )

Abe,T. ( Toshiba Corp.(Japan) )

Oogi,S. ( Toshiba Corp.(Japan) )

Anze,H. ( Toshiba Corp.(Japan) )

Shimizu,M. ( Toshiba Corp.(Japan) )

Itoh,M. ( Toshiba Corp.(Japan) )

Nakasugi.T. ( Toshiba Corp.(Japan) )

Iijima,T. ( Toshiba Machine Corp.(Japan) )

Hattori,Y. ( Toshiba Machine Corp.(Japan) )

4 more

Publication title:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3096

Pub. Year:

1997

Page(from):

173

Page(to):

177

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

Language:

English

Call no.:

P63600/3096

Type:

Conference Proceedings

Details

TDL ID:	ZA00016472
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1997 : 4th
Conf. info. (Venue):	Kawasaki, Japan
Conf. info. (Date):	1997.04.17-1997.04.18

Similar Items:

1 Conference Proceedings Control of resist heating effect Anze,H., Abe,T., Sakurai,H., Iijima,T., Hattori,Y., Nakayamada,N., Kamikubo,T. SPIE - The International Society for Optical Engineering	7 Conference Proceedings EB proximity effect correction system for 0.25-µm device reticle fabrication M. Tomita, H. Ohnuma, M. Koyama, H. Kawahira Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Advanced electron-beam writing system EX-11 for next-generation mask fabrication Tojo, T., Yoshikawa, R., Ogawa, Y., Tamamushi, S., Hattori, Y., Koikari, S., Kusakabe, H., Abe, T., Ogasawara, M., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings EBM-5000: electron-beam mask writer for 45 nm node [6283-04] Sunaoshi, H., Tachikawa, Y., Higurashi, H., Iijima, T., Suzuki, J., Kamikubo, T., Ohtoshi, K., Anze, H., Katsumata, T., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Proximity effect correction for reticle fabrication Sugiyama,M., Kubo,S., Hiruta,K., Iwamatsu,T., Fujisawa,T., Morimoto,H. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Modeling of charging effect and its correction by EB mask writer EBM-6000 N. Nakayamada, S. Wake, T. Kamikubo, H. Sunaoshi, S. Tamamushi Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Process optimization for mask fabrication Sakurai,H., Itoh,M., Kumagae,A., Anze,H., Abe,T., Higashikawa,I. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Novel methodology of employing scatterometry to assess optical proximity correction test pattern Asano, M., Koike, T., Mikami, T., Abe, H., Ikeda, T., Tanaka, S., Mimotogi, S. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Resist heating effect on 50-KeV EB mask writing Sakurai, H., Abe, T., Itoh, M., Kumagae, A., Anze, H., Higashikawa, I. SPIE - The International Society of Optical Engineering	11 Conference Proceedings CD controllability of proximity effect correction in EPL Shimizu, S., Suzuki, K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Study of heating effect on CAR in electron-beam mask writing T. Kamikubo, M. Hiramoto, J. Yashima, M. Takahashi, R. Nishimura, T. Katsumata, H. Anze, H. Sunaoshi, S. Tamamushi, M. … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Investigation of proximity effect correction in electron projection lithography(EPI) Okino,T., Suzuki,K., Okamoto,K., Kawata,S., Uchikawa,K., Suzuki,S., Shimizu,S., Fujiwara,T., Yamada,A., Kamijo,K. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12