Multipass gray printing for a new MEBES 4500S mask lithography system
- Author(s):
Abboud,F.E. ( Etec Systems,Inc.(USA) ) Dean,R.L. ( Etec Systems,Inc.(USA) ) Doering,J.J. ( Etec Systems,Inc.(USA) ) Eckes,W. ( Etec Systems,Inc.(USA) ) Gesley,M.A. ( Etec Systems,Inc.(USA) ) Hofmann,U. ( Etec Systems,Inc.(USA) ) Mulera,T. ( Etec Systems,Inc.(USA) ) Naber,R.J. ( Etec Systems,Inc.(USA) ) Pastor,M. ( Etec Systems,Inc.(USA) ) Phillips,W. ( Etec Systems,Inc.(USA) ) Raphael,J. ( Etec Systems,Inc.(USA) ) Raymond,F.,?. ( Etec Systems,Inc.(USA) ) Sauer,C.A. ( Etec Systems,Inc.(USA) ) - Publication title:
- Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3096
- Pub. Year:
- 1997
- Page(from):
- 116
- Page(to):
- 124
- Pub. info.:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425164 [0819425168]
- Language:
- English
- Call no.:
- P63600/3096
- Type:
- Conference Proceedings
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