Development of an in-situ cleaning system for an e-beam reticle writer

Development of an in-situ cleaning system for an e-beam reticle writer

Author(s):

Ohtoshi,K. ( Toshiba Machine Co.,Ltd.(Japan) )

Yamasaki,S. ( Toshiba Machine Co.,Ltd.(Japan) )

Tamamushi,S. ( Toshiba Machine Co.,Ltd.(Japan) )

Tojo,T. ( Toshiba Machine Co.,Ltd.(Japan) )

Hirano,R. ( Toshiba Machine Co.,Ltd.(Japan) )

Fukudome,Y. ( Toshiba Corp.(Japan) )

Shimomura,N. ( Toshiba Corp.(Japan) )

Nishimura,S. ( Toshiba Corp.(Japan) )

Yoshitake,S. ( Toshiba Corp.(Japan) )

Ogasawara,M. ( Toshiba Corp.(Japan) )

5 more

Publication title:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3096

Pub. Year:

1997

Page(from):

68

Page(to):

71

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

Language:

English

Call no.:

P63600/3096

Type:

Conference Proceedings

Details

TDL ID:	ZA00016472
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1997 : 4th
Conf. info. (Venue):	Kawasaki, Japan
Conf. info. (Date):	1997.04.17-1997.04.18

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