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Marathon damage testing of pellicles for 193-nm lithography

Author(s):
Grenville,A. ( Intel Corp. )
Liberman,V. ( MIT Lincoln Lab. )
Kunz,R.R. ( MIT Lincoln Lab. )
Rothschild,M. ( MIT Lincoln Lab. )
Sedlacek,J.H.C. ( MIT Lincoln Lab. )
Uttaro,R.S. ( MIT Lincoln Lab. )
1 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. Year:
1998
Page(from):
456
Page(to):
463
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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