On the way to 1 Gb: demonstration of e-beam proximity effect correction for mask making
- Author(s):
- Rosenbusch,A. ( Sigma-C GmbH (FRG) )
- Kalus,C.K. ( Sigma-C GmbH (FRG) )
- Endo,H. ( OKI Electric Industry Co.,Ltd. (Japan) )
- Kimura,Y. ( OKI Electric Industry Co.,Ltd. (Japan) )
- Endo,A. ( OKI Electric Industry Co.,Ltd. (Japan) )
- Publication title:
- 17th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3236
- Pub. Year:
- 1998
- Page(from):
- 312
- Page(to):
- 318
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426697 [0819426695]
- Language:
- English
- Call no.:
- P63600/3236
- Type:
- Conference Proceedings
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