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Current status of mask CD uniformity as related to e-beam system

Author(s):
Lim,S.-C. ( Samsung Electronics Co.,Ltd. (Korea) )
Kim,B.-G. ( Samsung Electronics Co.,Ltd. (Korea) )
Choi,S.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
Lee,K.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
Cho,H.-J. ( Samsung Electronics Co.,Ltd. (Korea) )
Yu,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
Cho,H.-K. ( Samsung Electronics Co.,Ltd. (Korea) )
Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) )
3 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. Year:
1998
Page(from):
301
Page(to):
311
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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